Michael Leeson

Patterning of Tailored Polycarbonate Based Non‐Chemically Amplified Resists Using Extreme Ultraviolet Lithography

Anguang Yu, Heping Liu, James P. Blinco et al. · Macromolecular Rapid Communications · 2010 · 48 citations

Natural Sciences, Materials Engineering, Materials Science +17

High transmission pellicles for extreme ultraviolet lithography reticle protection

Yashesh Shroff, Michael Leeson, Pei-yang Yan et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 39 citations

Engineering, Materials Engineering, Materials Science +15

Measurement and analysis of EUV photoresist related outgassing and contamination

Ivan Pollentier, G. Aksenov, A. M. Goethals et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 18 citations

Natural Sciences, Chemistry, Analytical Chemistry +13

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd R. Younkin, Michael Leeson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 18 citations

Engineering, Electrical Engineering, Materials Science +11

Development of polymers for non-CAR resists for EUV lithography

Andrew K. Whittaker, Idriss Blakey, James P. Blinco et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +13