Pei-yang Yan

Progress in extreme ultraviolet mask repair using a focused ion beam

Ted Liang, Alan R. Stivers, Richard H. Livengood et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 56 citations

Engineering, Materials Engineering, Materials Science +15

<title>System integration and performance of the EUV engineering test stand</title>

Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 40 citations

Natural Sciences, Physics, Digital Imaging +7

High transmission pellicles for extreme ultraviolet lithography reticle protection

Yashesh Shroff, Michael Leeson, Pei-yang Yan et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 39 citations

Engineering, Materials Engineering, Materials Science +15

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 38 citations

Natural Sciences, Electrical Engineering, Microfabrication +11

Evaluation of protection schemes for extreme ultraviolet lithography (EUVL) masks against top–down aerosol flow

Se‐Jin Yook, Christof Asbach, Jung Hyeun Kim et al. · Journal of Aerosol Science · 2007 · 38 citations

Engineering, Materials Engineering, Radiation Protection +14