Ted Liang

Advanced photolithographic mask repair using electron beams

Ted Liang, Eric Frendberg, Barry Lieberman et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 75 citations

Engineering, Electron-beam Lithography, Ophthalmology +11

EUV progress toward HVM readiness

Britt Anne Turkot, Steven L. Carson, Anna Lio et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 65 citations

Electrical Engineering, Engineering, Technology Readiness Level +14

Progress in extreme ultraviolet mask repair using a focused ion beam

Ted Liang, Alan R. Stivers, Richard H. Livengood et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 56 citations

Ion Implantation, Engineering, Electron-beam Lithography +13

Inhibiting spontaneous etching of nanoscale electron beam induced etching features: Solutions for nanoscale repair of extreme ultraviolet lithography masks

Matthew Lassiter, Ted Liang, Philip D. Rack · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 45 citations

Engineering, Electron-beam Lithography, Active Electron Beam +19

Damage-free mask repair using electron-beam-induced chemical reactions

Ted Liang, Alan R. Stivers · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 39 citations

Ion Implantation, Engineering, Electron-beam Lithography +13