Advanced photolithographic mask repair using electron beams

Ted Liang, Eric Frendberg, Barry Lieberman, +1

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringElectron-beam LithographyOphthalmologyMicroscopyElectron Beam +9

EUV progress toward HVM readiness

Britt Anne Turkot, Steven L. Carson, Anna Lio, +7

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringEngineeringTechnology Readiness LevelEuv ProgressMicrofabrication +12

Progress in extreme ultraviolet mask repair using a focused ion beam

Ted Liang, Alan R. Stivers, Richard H. Livengood, +3

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Ion ImplantationEngineeringElectron-beam LithographyOphthalmologyMicrofabrication +11

Inhibiting spontaneous etching of nanoscale electron beam induced etching features: Solutions for nanoscale repair of extreme ultraviolet lithography masks

Matthew Lassiter, Ted Liang, Philip D. Rack

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringElectron-beam LithographyActive Electron BeamPattern TransferVacuum Device +17

Damage-free mask repair using electron-beam-induced chemical reactions

Ted Liang, Alan R. Stivers

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Ion ImplantationEngineeringElectron-beam LithographyOphthalmologyBeam Lithography +11

Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Leonid Belau, Jeong Young Park, Ted Liang, +2

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringChemistryExtreme UltravioletChemical EngineeringChemical Influence +15

Helium ion microscope invasiveness and imaging study for semiconductor applications

Richard H. Livengood, Yuval Greenzweig, Ted Liang, +1

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Materials ScienceEngineeringElectron MicroscopyPhysicsMicroscopy +13

<title>TaN EUVL mask fabrication and characterization</title>

Pei-yang Yan, Guojing Zhang, Andy Ma, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMechanical EngineeringSurface ProcessingChemical Engineering +15

EUV mask absorber characterization and selection

Pei-yang Yan, Guojing Zhang, Patrick Kofron, +4

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials ScienceChemical EngineeringEngineeringSurface ProcessingSurface Science +10

EUV mask pattern defect printability

Ted Liang, Guojing Zhang, Patrick Naulleau, +4

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyPattern Defect SpecificationsComputer-aided DesignDefect Tolerance +15