A. M. Goethals

Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy

Gian F. Lorusso, A. M. Goethals, R. Jonckheere et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 30 citations

Engineering, Extreme Ultraviolet Lithography, Beam Lithography +12

EUV lithography program at IMEC

A. M. Goethals, R. Jonckheere, Gian F. Lorusso et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 28 citations

Optical Materials, Engineering, Electron-beam Lithography +16

Lithography Options for the 32 nm Half Pitch Node and Beyond

Kurt Ronse, P. Jansen, Roel Gronheid et al. · IEEE Transactions on Circuits and Systems I Regular Papers · 2009 · 26 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Progress in EUV resist Performance

A. M. Goethals, Roel Gronheid, Frieda Van Roey et al. · Journal of Photopolymer Science and Technology · 2006 · 23 citations · Full text

Euv Resist Performance, Engineering, Electron-beam Lithography +18

Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

Alan Myers, Gian F. Lorusso, In‐Hui Kim et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 20 citations

Optical Materials, Engineering, Electron-beam Lithography +19