Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy

Gian F. Lorusso, A. M. Goethals, R. Jonckheere, +7

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringExtreme Ultraviolet LithographyBeam LithographyMicrofabricationOptical Properties +10

EUV lithography program at IMEC

A. M. Goethals, R. Jonckheere, Gian F. Lorusso, +11

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringElectron-beam LithographyOptical TestingComputer-aided Design +14

Lithography Options for the 32 nm Half Pitch Node and Beyond

Kurt Ronse, P. Jansen, Roel Gronheid, +6

IEEE Transactions on Circuits and Systems I Regular Papers

Optical MaterialsEngineeringElectron-beam LithographyMicroscopyWafer Scale Processing +17

Progress in EUV resist Performance

A. M. Goethals, Roel Gronheid, Frieda Van Roey, +2

Journal of Photopolymer Science and Technology

Euv Resist PerformanceEngineeringElectron-beam LithographyMicroscopyOptical Testing +16

Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

Alan Myers, Gian F. Lorusso, In‐Hui Kim, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Optical MaterialsEngineeringElectron-beam LithographyExperimental ValidationOptic Design +17

Characterization of EUV optics contamination due to photoresist related outgassing

Ivan Pollentier, A. M. Goethals, Roel Gronheid, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringElectron-beam LithographyOptical TestingOptics Contamination +14

Progresses and Challenges of EUV Lithography Materials

Danilo De Simone, A. M. Goethals, Frieda Van Roey, +5

Journal of Photopolymer Science and Technology

Materials ScienceMaterials EngineeringEngineeringElectron-beam LithographyHigh Sensitivity +13

Measurement and analysis of EUV photoresist related outgassing and contamination

Ivan Pollentier, G. Aksenov, A. M. Goethals, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Environmental MonitoringEngineeringPhotochemistryMeasurementOptical Diagnostics +12

Imaging performance of the EUV alpha semo tool at IMEC

Gian F. Lorusso, Jan Hermans, A. M. Goethals, +13

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyInstrumentation EngineeringWafer Scale ProcessingBeam Lithography +20

Gas phase silylation in the diffusion enhanced silylated resist process for application to sub-0.5 μm optical lithography

Ki‐Ho Baik, Luc Van den hove, A. M. Goethals, +2

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Optical MaterialsEngineeringElectron-beam LithographyOptoelectronic DevicesChemistry +15