Terence Bacuita

Effects of flare in extreme ultraviolet lithography: Learning from the engineering test stand

Manish Chandhok, Sang H. Lee, Terence Bacuita · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 31 citations

Engineering, Optometry, Contrast Sensitivity +14

Sources of line-width roughness for EUV resists

Heidi B. Cao, Wang Yueh, Bryan J. Rice et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 22 citations

Engineering, Electrical Engineering, Materials Science +10

One small step: world's first integrated EUVL process line

J. M. Roberts, Terence Bacuita, Robert Bristol et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 18 citations

Engineering, Electrical Engineering, Manufacturing Engineering +10

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd R. Younkin, Michael Leeson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 18 citations

Engineering, Electrical Engineering, Materials Science +11

Exposing extreme ultraviolet lithography at Intel

J. M. Roberts, Terence Bacuita, Robert Bristol et al. · Microelectronic Engineering · 2006 · 16 citations

Engineering, Computer Engineering, Electrical Engineering +6