Heidi B. Cao

Acid distribution in chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 152 citations

Ultraviolet Light, Chemical Engineering, Optical Materials +15

Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms

Heidi B. Cao, Paul F. Nealey, Wolf‐Dieter Domke · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 88 citations

Engineering, Electron-beam Lithography, Microscopy +22

Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography

Seung Wook Chang, Ramakrishnan Ayothi, Daniel Bratton et al. · Journal of Materials Chemistry · 2006 · 85 citations

Engineering, Electron-beam Lithography, Euv Lithography +20

Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa et al. · Japanese Journal of Applied Physics · 2007 · 71 citations

Engineering, Electron-beam Lithography, Acid Generation +18

Study of the Structure−Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography

Anuja De Silva, Jin‐Kyun Lee, Xavier André et al. · Chemistry of Materials · 2008 · 56 citations

Optical Materials, Engineering, Electron-beam Lithography +18