Anuja De Silva

Molecular Glass Resists as High‐Resolution Patterning Materials

Anuja De Silva, Nelson Felix, Christopher K. Ober · Advanced Materials · 2008 · 109 citations

Materials Science, Molecular Glass, Engineering +15

Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy

Shuhui Kang, Wen‐Li Wu, Kwang-Woo Choi et al. · Macromolecules · 2010 · 58 citations

Optical Materials, Engineering, Kinetics Parameters +23

Study of the Structure−Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography

Anuja De Silva, Jin‐Kyun Lee, Xavier André et al. · Chemistry of Materials · 2008 · 56 citations

Optical Materials, Engineering, Electron-beam Lithography +18

Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition—Defectivity Reduction by Monolayer Design

Rudy J. Wojtecki, Magi Mettry, Noah F. Fine Nathel et al. · ACS Applied Materials & Interfaces · 2018 · 47 citations

Materials Science, Engineering, Beam Lithography +13

Phenolic molecular glasses as resists for next-generation lithography

Xavier André, Jin Kyun Lee, Anuja De Silva et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 30 citations

Optical Materials, Engineering, Bulky Phenol Structures +20