Kwang-Woo Choi - Concepedia

Author

Kwang-Woo Choi

Intel (United States)

Also Known As

K.-W. Choi, KiHoon Choi, Kwang-Woo Choi, KwangMo Choi

Publications

242

Citations

H-Index

Concepts

All Affiliations

Intel (United States)National Institute of Standards and Technology Cornell University

About

Kwang-Woo Choi is an author at Intel (United States) specializing in applied physics, engineering, and photochemistry.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	175
2	Applied Physics	6	6	175
3	Natural Sciences	2	2	68
4	Chemistry	2	2	68
5	Electrical Engineering	1	1	75

Kwang-Woo Choi

Publications

193

Citations

H-Index

Page 1

	Year	Citations
Band offsets of atomic-layer-deposited Al2O3 on GaAs and the effects of surface treatment Nhan V. Nguyen, Oleg A. Kirillov, Wen Jiang, Applied Physics Letters Aluminium NitrideEngineeringOptoelectronic DevicesBand GapSemiconductor Device	2008	75
Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy Shuhui Kang, Wen‐Li Wu, Kwang-Woo Choi, Macromolecules Optical MaterialsEngineeringKinetics ParametersOptoelectronic DevicesChemistry	2010	58
Nonplanar high-k dielectric thickness measurements using CD-SAXS Chengqing Wang, Kwang-Woo Choi, Yi-Ching Chen, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2009	18
Fundamentals of the reaction-diffusion process in model EUV photoresists Kristopher A. Lavery, Kwang-Woo Choi, Bryan D. Vogt, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringBeam LithographyNumerical SimulationModel Euv Photoresists	2006	11
Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist Kwang-Woo Choi, Vivek M. Prabhu, Kristopher A. Lavery, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Short Wavelength OpticEngineeringElectron-beam LithographyModel Euv PhotoresistCurrent Extreme Ultraviolet	2007	11
A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists Shuhui Kang, Kristopher A. Lavery, Kwang-Woo Choi, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Chemical KineticsEngineeringElectron-beam LithographyMolecular-glass PhotoresistsChemistry	2008	10
Lateral length scales of latent image roughness as determined by off-specular neutron reflectivity Kristopher A. Lavery, Vivek M. Prabhu, Eric K. Lin, Applied Physics Letters EngineeringNuclear PhysicsElectron-beam LithographyMicroscopyLatent Image	2008	10

Page 1