Nelson Felix

Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET

N. Loubet, Terence B. Hook, P. Montanini et al. · 2017 · 988 citations

Engineering, Electrical Engineering, Microelectronics +15

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

Ruijie Xie, P. Montanini, Kerem Akarvardar et al. · 2016 · 144 citations

Engineering, Electrical Engineering, Materials Science +15

Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

Chi‐Chun Liu, Elliott Franke, Yann Mignot et al. · Nature Electronics · 2018 · 136 citations

Natural Sciences, Electrical Engineering, Materials Science +14

Molecular Glass Resists as High‐Resolution Patterning Materials

Anuja De Silva, Nelson Felix, Christopher K. Ober · Advanced Materials · 2008 · 117 citations

Natural Sciences, Materials Engineering, Materials Science +6

Molecular Glass Resists for High-Resolution Patterning

Jun Yan Dai, Seung Wook Chang, Alyssandrea H. Hamad et al. · Chemistry of Materials · 2006 · 104 citations

Natural Sciences, Materials Engineering, Materials Science +8