Seung Wook Chang - Concepedia

Author

Seung Wook Chang

Cornell University

Also Known As

Seung W. Chang, Seung Wook Chang

Publications

934

Citations

H-Index

Concepts

All Affiliations

Cornell University Intel (United States)Division of Materials Science and Engineering

About

Seung Wook Chang is an author at Cornell University specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	337
2	Applied Physics	6	6	337
3	Materials Science	6	6	337
4	Chemistry	5	5	316
5	Natural Sciences	2	2	95

Seung Wook Chang

Publications

914

Citations

H-Index

Page 1

	Year	Citations
Activity of <i>Candida rugosa</i> Lipase Immobilized on γ-Fe<sub>2</sub>O<sub>3</sub> Magnetic Nanoparticles Ansil Dyal, Katja Loos, M.G. Noto, Journal of the American Chemical Society	2003	551
Molecular Glass Resists for High-Resolution Patterning Jun Yan Dai, Seung Wook Chang, Alyssandrea H. Hamad, Chemistry of Materials EngineeringOptical GlassGlass MaterialChemistryBeam Lithography	2006	103
Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography Seung Wook Chang, Ramakrishnan Ayothi, Daniel Bratton, Journal of Materials Chemistry EngineeringElectron-beam LithographyEuv LithographyChemistrySub-50 Nm Feature	2006	85
Molecular glass photoresists for advanced lithography Da Yang, Seung Wook Chang, Christopher K. Ober Journal of Materials Chemistry Materials ScienceEngineeringElectron-beam LithographyBeam LithographyOptical Properties	2006	82
Lithography Based on Molecular Glasses Kousuke Tsuchiya, Seung Wook Chang, Nelson Felix, Journal of Photopolymer Science and Technology Materials ScienceEngineeringBeam LithographyMicrofabricationGlass Transition	2005	36
Increased Expression of Osteopontin in Retinal Degeneration Induced by Blue Light-Emitting Diode Exposure in Mice Seung Wook Chang, Hyung‐Il Kim, Gyu Hyun Kim, Frontiers in Molecular Neuroscience	2016	26
Materials for future lithography (Invited Paper) Seung Wook Chang, Da Yang, Jun Yan Dai, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Materials ScienceOptical MaterialsEngineeringElectronic MaterialsHigh Resolution	2005	21
New PFOS Free Photoresist Systems for EUV Lithography Ramakrishnan Ayothi, Seung Wook Chang, Nelson Felix, Journal of Photopolymer Science and Technology Non-pfos PagsEngineeringElectron-beam LithographyFree Photoacid GeneratorsEuv Lithography	2006	10

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