Lithography Based on Molecular Glasses

Abstract

Several novel classes of molecular glasses were synthesized as photoresist materials for next generation lithography. These compounds were protected by protecting groups for chemically amplified systems and proved to possess high glass transition temperature (Tg) as well as amorphous properties. A positive-tone photoresist system with hexa(t-butoxy- carbonyloxyphenyl)benzene was demonstrated using E-beam lithography and 200 nm pattern size was obtained.