Anti-Biofouling Properties of Comblike Block Copolymers with Amphiphilic Side Chains

Sitaraman Krishnan, Ramakrishnan Ayothi, Alexander Hexemer, +8

Langmuir

Self-cleaning SurfaceBlock Co-polymersEngineeringSurface FunctionalizationChemical Composition +11

Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography

Seung Wook Chang, Ramakrishnan Ayothi, Daniel Bratton, +5

Journal of Materials Chemistry

EngineeringElectron-beam LithographyEuv LithographyChemistrySub-50 Nm Feature +18

Diazonaphthoquinone Molecular Glass Photoresists:  Patterning without Chemical Amplification

Daniel Bratton, Ramakrishnan Ayothi, Hai Deng, +2

Chemistry of Materials

Materials ScienceDiazonaphthoquinone Molecular GlassChemical AmplificationEngineeringPhotochemistry +11

Non-ionic photo-acid generators for applications in two-photon lithography

Lorenz Steidl, Shalin J. Jhaveri, Ramakrishnan Ayothi, +6

Journal of Materials Chemistry

EngineeringElectron-beam LithographyResponsive PolymersSynthetic PhotochemistryOptoelectronic Devices +16

Arylonium Photoacid Generators Containing Environmentally Compatible Aryloxyperfluoroalkanesulfonate Groups

Ramakrishnan Ayothi, Yi Yi, Heidi B. Cao, +3

Chemistry of Materials

Materials SciencePhotoacid GeneratorsChemical EngineeringEngineeringPhotochemistry +11

Novel EUV resist development for sub-14nm half pitch

Masafumi Hori, Takehiko Naruoka, Hisashi Nakagawa, +8

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

High ResolutionEngineeringElectron-beam LithographyExtreme UltravioletWafer Scale Processing +17

Novel EUV Resist Development for Sub-14nm Half Pitch

Takakazu Kimoto, Takehiko Naruoka, Hisashi Nakagawa, +8

Journal of Photopolymer Science and Technology

High ResolutionEngineeringElectron-beam LithographyExtreme UltravioletWafer Scale Processing +17

Molecular glass resists for next generation lithography

Daniel Bratton, Ramakrishnan Ayothi, Nelson Felix, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringElectron-beam LithographyHigh Resolution PatternsChemistry +18

Novel EUV resist materials for 16nm half pitch and EUV resist defects

Motohiro Shiratani, Takehiko Naruoka, Ken Maruyama, +6

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyFluorine UnitsDefect ToleranceExtreme Ultraviolet +19

Sulfonium Salts of Alicyclic Group Functionalized Semifluorinated Alkyl Ether Sulfonates As Photoacid Generators

Yi Yi, Ramakrishnan Ayothi, Wang Yueh, +4

Chemistry of Materials