Hai Deng

Acid distribution in chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 152 citations

Natural Sciences, Materials Engineering, Materials Science +13

Stereospecific Polymerization of Methyl Methacrylate Initiated by Zirconocene dimethyl/B(C6F5)3 (or Ph3C B(C6F5)4)/Zn(C2H5)2

Kazuo Soga, Hai Deng, Takuya Yano et al. · Macromolecules · 1994 · 111 citations

Natural Sciences, Chemistry, Materials Science +9

Isospecific Polymerization of Methyl Methacrylate Initiated by Chiral Zirconocenedimethyl/Ph3CB(C6F5)4 in the Presence of Lewis Acid

Hai Deng, Takeshi Shiono, Kazuo Soga · Macromolecules · 1995 · 98 citations

Natural Sciences, Chemistry, Materials Science +9

Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography

Seung Wook Chang, Ramakrishnan Ayothi, Daniel Bratton et al. · Journal of Materials Chemistry · 2006 · 86 citations

Natural Sciences, Materials Engineering, Materials Science +11

Polymerizable Lyotropic Liquid Crystals Containing Transition-Metal and Lanthanide Ions:  Architectural Control and Introduction of New Properties into Nanostructured Polymers

Hai Deng, Douglas L. Gin, Ryan C. Smith · Journal of the American Chemical Society · 1998 · 79 citations

Natural Sciences, Chemistry, Materials Science +17