Molecular glass photoresists for advanced lithography

Abstract

Molecular glass resists are low molecular-weight organic photoresist materials that readily form stable amorphous glasses above room temperature. We have created new families of molecular glass materials that function as both positive and negative resists capable of producing fine features as small as 35 nm line/space patterns using either extreme UV (13.4 nm) or electron beam lithography. These molecular glass resists have promising properties and are being considered as alternative choices to polymeric resists for next generation photoresist design.