Bryan J. Rice

Characterization of correlated line edge roughness of nanoscale line gratings using small angle x-ray scattering

Chengqing Wang, Ronald L. Jones, Eric K. Lin et al. · Journal of Applied Physics · 2007 · 56 citations

Engineering, Electron-beam Lithography, Microscopy +17

EUV pellicle development for mask defect control

Yashesh Shroff, Michael Goldstein, Bryan J. Rice et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 47 citations

Materials Science, Chemical Engineering, Engineering +15

Determination of the line edge roughness specification for 34 nm devices

T. Linton, Manish Chandhok, Bryan J. Rice et al. · 2003 · 44 citations

Engineering, Ler Effects, Ler Spectrum +16

Numerical Simulation of Laser-Produced Plasma Devices for EUV Lithography Using the Heights Integrated Model

V. Sizyuk, A. Hassanein, Vitali Morozov et al. · Numerical Heat Transfer Part A Applications · 2006 · 36 citations

Engineering, Laser-plasma Interaction, Total Variation +24

An analysis of double exposure lithography options

Saul Lee, Jeffrey D. Byers, Kane Jen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 32 citations · Full text