Bryan J. Rice - Concepedia

Author

Bryan J. Rice

Intel (United States)

Also Known As

B. J. Rice, B. Rice, B.J. Rice, Bryan J. Rice, Bryan Rice, H. R. Weller

Publications

911

Citations

H-Index

Concepts

All Affiliations

Intel (United States)Argonne National Laboratory University of Illinois Urbana-Champaign University of Wisconsin–Madison The University of Queensland

About

Bryan J. Rice is an author at Intel (United States) specializing in engineering, applied physics, and instrumentation.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	21	474
2	Applied Physics	13	17	388
3	Natural Sciences	3	3	61
4	Education	2	2	41
5	Chemical Engineering	1	1	47

Bryan J. Rice

Publications

571

Citations

H-Index

Page 1

	Year	Citations
Characterization of correlated line edge roughness of nanoscale line gratings using small angle x-ray scattering Chengqing Wang, Ronald L. Jones, Eric K. Lin, Journal of Applied Physics EngineeringElectron-beam LithographyMicroscopyElectron DiffractionLaser Fabrication	2007	56
EUV pellicle development for mask defect control Yashesh Shroff, Michael Goldstein, Bryan J. Rice, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Materials ScienceChemical EngineeringEngineeringBeam LithographyFlexible Electronics	2006	47
Determination of the line edge roughness specification for 34 nm devices T. Linton, Manish Chandhok, Bryan J. Rice, EngineeringLer EffectsLer SpectrumInterconnect (Integrated Circuits)Semiconductor Device	2003	44
Numerical Simulation of Laser-Produced Plasma Devices for EUV Lithography Using the Heights Integrated Model V. Sizyuk, A. Hassanein, Vitali Morozov, Numerical Heat Transfer Part A Applications EngineeringLaser-plasma InteractionTotal VariationPlasma ScienceLaser Plasma Physic	2006	36
An analysis of double exposure lithography options Saul Lee, Jeffrey D. Byers, Kane Jen, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2008	32
Implementing flare compensation for EUV masks through localized mask CD resizing Christof G. Krautschik, Manish Chandhok, Guojing Zhang, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringEngineeringElectron-beam LithographyOphthalmologyComputer Engineering	2003	27
Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices A. Hassanein, V. Sizyuk, V. I. Tolkach, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyTarget FabricationTotal VariationDpp Devices	2004	24
Characterization of CD-SEM metrology for iArF photoresist materials Benjamin Bunday, Aaron Cordes, Ndubuisi G. Orji, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Cd-sem MetrologyEngineeringElectron-beam LithographyMicroscopyOptical Testing	2008	23
Sources of line-width roughness for EUV resists Heidi B. Cao, Wang Yueh, Bryan J. Rice, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringLwr RequirementsElectron-beam LithographyTarget FabricationVary Resist Parameters	2004	22
Value-Added Metrology Benjamin Bunday, John A. Allgair, Mark Caldwell, IEEE Transactions on Semiconductor Manufacturing EngineeringIndustrial EngineeringMeasurementEducationDimensioning And Tolerancing	2007	22

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