Kane Jen

Implementation of an imprint damascene process for interconnect fabrication

Gerard M. Schmid, M. D. Stewart, J. T. Wetzel et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 83 citations

Engineering, Electrical Engineering, Materials Science +16

Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography

Satoshi Takei, Tsuyoshi Ogawa, Ryan Deschner et al. · Japanese Journal of Applied Physics · 2010 · 34 citations

Engineering, Materials Engineering, Materials Science +17

An analysis of double exposure lithography options

Saul Lee, Jeffrey D. Byers, Kane Jen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 32 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +13

Direct imprinting of dielectric materials for dual damascene processing

M. D. Stewart, Jeffery T. Wetzel, Gerard M. Schmid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 32 citations

Engineering, Electrical Engineering, Materials Engineering +12

Double Exposure Materials: Simulation Study of Feasibility

Jeffrey D. Byers, Saul Lee, Kane Jen et al. · Journal of Photopolymer Science and Technology · 2007 · 27 citations · Full text

Engineering, Materials Engineering, Materials Science +7