Demonstration, Analysis, and Device Design Considerations for Independent DG MOSFETs

Meishoku Masahara, Yongxun Liu, Kunihiro Sakamoto, Kazuhiko Endo, Takashi Matsukawa, K. Ishii, T. Sekigawa, H. Yamauchi, H. Tanoue, S. Kanemaru,

IEEE Transactions on Electron Devices · 2005 · 130 citations · 17 references

Concepts

Abstract

This paper describes a comprehensive study on the threshold voltage (V/sub th/) controllability of four-terminal-driven double-gate (DG) MOSFETs (4T-XMOSFETs) with independently switched DGs. Two types of 4T-XMOSFETs (fin and vertical) are experimentally demonstrated and their V/sub th/ controllability is thoroughly investigated in relation to the initial V/sub th/ in the DG-mode based on comprehensible modeling of the devices. Based on the investigation and simulated predictions, device design guidelines for 4T-XMOSFETs are proposed. Decreasing the workfunction of the DGs and increasing the oxide thickness of the second gate (T/sub ox2/) are preferable for improving the performance of the 4T-XMOSFET. The optimum workfunction of DGs for attaining low I/sub off(stand-by)/ and high I/sub on(active)/ under the limited V/sub g2/ condition is also proposed.

References

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