IEEE Transactions on Electron Devices · 2005 · 130 citations · 17 references
EngineeringElectrical EngineeringCircuit TheoryMicroelectronicsSemiconductor DevicesDevice CharacterizationDevice ModelingDevice ScalingDevice SimulationIntegrated Circuit DesignMetal-oxide-semiconductor Field-effect TransistorsControllabilityGate Oxide Thickness EffectsModelingMosfet ModelingOxide Thickness ControlThreshold VoltageThreshold Voltage ControlThreshold Voltage Modeling
This paper describes a comprehensive study on the threshold voltage (V/sub th/) controllability of four-terminal-driven double-gate (DG) MOSFETs (4T-XMOSFETs) with independently switched DGs. Two types of 4T-XMOSFETs (fin and vertical) are experimentally demonstrated and their V/sub th/ controllability is thoroughly investigated in relation to the initial V/sub th/ in the DG-mode based on comprehensible modeling of the devices. Based on the investigation and simulated predictions, device design guidelines for 4T-XMOSFETs are proposed. Decreasing the workfunction of the DGs and increasing the oxide thickness of the second gate (T/sub ox2/) are preferable for improving the performance of the 4T-XMOSFET. The optimum workfunction of DGs for attaining low I/sub off(stand-by)/ and high I/sub on(active)/ under the limited V/sub g2/ condition is also proposed.
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A folded-channel MOSFET for deep-sub-tenth micron era
Digh Hisamoto, Wen‐Chin Lee, J. Kedzierski et al. · 2002 · 243 citations