UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale

H. Schmitt, B. Amon, Susanne Beuer, S. Petersen, Mathias Rommel, Anton J. Bauer, H. Ryssel

Microelectronic Engineering · 2008 · 11 citations · 5 references

DOIFull text

Open access

Concepts

References

5