B. Amon

Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques

Mathias Rommel, G. Spoldi, V. Yanev et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 38 citations · Full text

Natural Sciences, Materials Science, Physics +15

Germanium substrate loss during thermal processing

Rebecca Kaiser, S. Koffel, P. Pichler et al. · Microelectronic Engineering · 2010 · 32 citations

Engineering, Materials Engineering, Materials Science +12

Honeycomb voids due to ion implantation in germanium

Rebecca Kaiser, S. Koffel, P. Pichler et al. · Thin Solid Films · 2009 · 27 citations · Full text

Engineering, Materials Engineering, Materials Science +10

Experiments and simulation of the diffusion and activation of the n-type dopants P, As, and Sb implanted into germanium

S. Koffel, Rebecca Kaiser, Anton J. Bauer et al. · Microelectronic Engineering · 2010 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +12

UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale

H. Schmitt, B. Amon, Susanne Beuer et al. · Microelectronic Engineering · 2008 · 11 citations · Full text

Engineering, Manufacturing Engineering, Materials Science +12