Experiments and simulation of the diffusion and activation of the n-type dopants P, As, and Sb implanted into germanium - Concepedia

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Experiments and simulation of the diffusion and activation of the n-type dopants P, As, and Sb implanted into germanium

27

Citations

19

References

2010

Year

S. Koffel, Rebecca Kaiser, Anton J. Bauer, B. Amon, P. Pichler, J. Lorenz, L. Frey, P. Scheiblin, V. Mazzocchi, Jean‐Paul Barnes,

Microelectronic Engineering

Materials ScienceIi-vi SemiconductorN-type Dopants PEngineeringApplied PhysicsSemiconductor MaterialGermanene

References

	Year	Citations

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