Concepedia

Author

V. Yanev

Fraunhofer Institute for Integrated Systems and Device Technology

Also Known As

V Yanev, V. C. Yanev, V. Yanev, Vasil Yanev

22

Publications

340

Citations

11

H-Index

33

Concepts

All Affiliations

Fraunhofer Institute for Integrated Systems and Device TechnologySchott (Germany)Friedrich-Alexander-Universität Erlangen-NürnbergTechnische Universität IlmenauGeorgi Nadjakov Institute of Solid State Physics
VY

About

V. Yanev is an author at Fraunhofer Institute for Integrated Systems and Device Technology specializing in engineering, applied physics, and materials science.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

10

11

294

2

Applied Physics

10

11

294

3

Electrical Engineering

3

3

54

4

Materials Engineering

3

3

51

5

Biomedical Engineering

1

1

10

V. Yanev

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12

Publications

312

Citations

11

H-Index

YearCitations

Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics

V. Yanev, Mathias Rommel, M. Lemberger,

Applied Physics Letters

2008

85

Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques

Mathias Rommel, G. Spoldi, V. Yanev,

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

2010

38

Investigations of MBE grown InN and the influence of sputtering on the surface composition

Stefan Krischok, V. Yanev, O. Balykov,

Surface Science

2004

30

Influence of the RF power on the deposition rate and the chemical surface composition of fluorocarbon films prepared in dry etching gas plasma

V. Yanev, Stefan Krischok, Andreas Opitz,

Surface Science

2004

28

Improved insight in charge trapping of high-k ZrO2/SiO2 stacks by use of tunneling atomic force microscopy

A. Paskaleva, V. Yanev, Mathias Rommel,

Journal of Applied Physics

2008

26

Experimental observation of FIB induced lateral damage on silicon samples

G. Spoldi, Susanne Beuer, Mathias Rommel,

Microelectronic Engineering

2009

24

Current Voltage Characteristics through Grains and Grain Boundaries of High-k Dielectric Thin Films Measured by Tunneling Atomic Force Microscopy

K. Murakami, Mathias Rommel, V. Yanev,

AIP conference proceedings

2011

18

A highly sensitive evaluation method for the determination of different current conduction mechanisms through dielectric layers

K. Murakami, Mathias Rommel, V. Yanev,

Journal of Applied Physics

2011

15

Effects of X-ray radiation on the surface chemical composition of plasma deposited thin fluorocarbon films

Marcel Himmerlich, V. Yanev, Andreas Opitz,

Polymer Degradation and Stability

2007

14

Comparative study between conventional macroscopic IV techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscale

V. Yanev, Tobias Erlbacher, Mathias Rommel,

Microelectronic Engineering

2009

13

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