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Influence of the RF power on the deposition rate and the chemical surface composition of fluorocarbon films prepared in dry etching gas plasma

DOI

28

Citations

6

References

2004

Year

V. Yanev, Stefan Krischok, Andreas Opitz, Helmut Wurmus, J. A. Schaefer, Norbert Schwesinger, S.I.‐U. Ahmed
Surface Science

References

YearCitations

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