Plasma Etching

Plasma Etching is a material processing technique within the broader category of plasma-surface interactions that specifically involves the use of reactive low-temperature plasma to selectively remove thin film material from a substrate through chemical and/or physical mechanisms at the atomic or molecular level.

4.5K

Publications

173.2K

Citations

12.2K

Authors

1.7K

Institutions

Publications per year

2017–2026

576

Authors

12.2K

  1. SJ
    S. J. Pearton

    University of Florida, United States

    142 publications · 5.4K citations

    39

    h-index

  2. GS
    G. S. Oehrlein

    University of Maryland, College Park, United States

    101 publications · 5.3K citations

    39

    h-index

  3. MJ
    Mark J. Kushner

    University of Illinois Urbana-Champaign, United States

    64 publications · 3.9K citations

    38

    h-index

  4. VM
    Vincent M. Donnelly

    University of Houston, United States

    51 publications · 3.7K citations

    30

    h-index

  5. HH
    Herbert H. Sawin

    Massachusetts Institute of Technology, United States

    45 publications · 2.4K citations

    29

    h-index

1–5 of 12.2K

Venues

  1. 68

    h-index

  2. Journal of Applied Physics

    266 publications · 14.5K citations

    64

    h-index

  3. Applied Physics Letters

    270 publications · 12.9K citations

    60

    h-index

  4. 50

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 338 publications · 9.7K citations

    45

    h-index

1–5