André Anders - Concepedia

Author

André Anders

Lawrence Berkeley National Laboratory ORCID

Also Known As

A A. Anders, A Anders, A. Anders, Adam Anders, Ahle, L.A., Anders, A., Anders, Andre, Anders, Andre; Andersson, Joakim, Anders, Andre; Fong, Walton; Kulkarni, Ashok; Ryan, Francis W.; Bhatia, C. Singh, Anders, Andre; Horwat, David; Anders, Andre

558

Publications

18.4K

Citations

H-Index

165

Concepts

All Affiliations

Lawrence Berkeley National Laboratory University of California, Berkeley Institute of High Current Electronics Leibniz Institute of Surface Engineering Leipzig University

About

André Anders is an author at Lawrence Berkeley National Laboratory specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	62	206	14K
2	Applied Physics	55	154	10.8K
3	Natural Sciences	17	20	907
4	Biomedical Engineering	6	6	162
5	Medicine	1	1	32

André Anders

247

Publications

15.1K

Citations

H-Index

Page 1

	Year	Citations
A structure zone diagram including plasma-based deposition and ion etching André Anders Thin Solid Films Materials ScienceEngineeringMicrofabricationPlasma ApplicationSurface Science	2009	873
Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals Guillermo García, Raffaella Buonsanti, Evan L. Runnerstrom, Nano Letters Materials SciencePlasmonicsEngineeringSurface PlasmonsPhysics	2011	558
Nanoindentation and Nanoscratching of Hard Carbon Coatings for Magnetic Disks Ting Y. Tsui, George M. Pharr, W. C. Oliver, MRS Proceedings Materials ScienceEngineeringCarbon-based MaterialNanomaterialsNanotechnology	1995	448
Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field André Anders, G. Yu. Yushkov Journal of Applied Physics EngineeringGlow DischargePlasma SciencePlasma PhysicsMagnetic Field	2002	379
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) André Anders Journal of Applied Physics EngineeringGlow DischargePlasma PhysicsReactive HipimsPlasma Processing	2017	378
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering André Anders, Joakim Andersson, Arutiun P. Ehiasarian Journal of Applied Physics Materials EngineeringElectrical EngineeringEngineeringPhysicsGlow Discharge	2007	340
Ion charge state distributions of vacuum arc plasmas: The origin of species André Anders Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics Vacuum Arc PlasmasEngineeringPhysicsPlasma TheoryApplied Physics	1997	339
Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic-arc deposition with substrate pulse biasing George M. Pharr, D. L. Callahan, S. D. McAdams, Applied Physics Letters EngineeringMechanical EngineeringThin Film Process TechnologySilicon On InsulatorCarbon-based Films	1996	270
Ion velocities in vacuum arc plasmas G. Yu. Yushkov, André Anders, I.G. Brown Journal of Applied Physics Electrical EngineeringVacuum Arc PlasmasEngineeringVacuum Arc PlasmaPhysics	2000	250
Review of cathodic arc deposition technology at the start of the new millennium David M. Sanders, André Anders Surface and Coatings Technology Materials EngineeringMaterials ScienceEngineeringCorrosionNew Millennium	2000	239

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