Journal of Applied Physics · 1980 · 880 citations · 7 references
Natural SciencesPhysicsOpticsPlasma PhysicsSpectroscopyAtomic Emission SpectroscopyEmission SpectroscopyOptical SpectroscopyPlasma DiagnosticsPlasma FundamentalsPlasma-surface InteractionsAtomic Emission SpectrometryDensity MeasurementsNoble Gas ChemistryOptical Emission SpectroscopyPlasma ChemistryPlasma Emission SpectroscopyPlasma EtchingPlasma Processes
The addition of a small concentration of suitably chosen noble gas to a reactive plasma is shown to permit the determination of the functional dependence of reactive particle density on plasma parameters. Examples illustrating the simplicity of this method are presented using F atomic emission from plasma-etching discharges and a comparison is made to available data in the literature.
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The Loading Effect in Plasma Etching
C. J. Mogab · Journal of The Electrochemical Society · 1977 · 222 citations