Concepedia
Statistics
Publications
77
Citations
6.6K
H-Index
43
Active since
1973
Affiliations
Friedrich Schiller University Jena(Current)
AT&T (United States)
TRUMPF (Germany)
S&F Systemtechnik (Germany)
Council for Scientific and Industrial Research
Daniel Flamm is an author at Friedrich Schiller University Jena specializing in natural sciences, materials science, and physics.
Publications per year
1973–2023
Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
C. J. Mogab, A. C. Adams, Daniel Flamm · Journal of Applied Physics · 1978 · 565 citations
Natural Sciences, Materials Science, Physics +14
The reaction of fluorine atoms with silicon
Daniel Flamm, Vincent M. Donnelly, J. A. Mucha · Journal of Applied Physics · 1981 · 332 citations
Natural Sciences, Chemistry, Materials Science +17
The design of plasma etchants
Daniel Flamm, Vincent M. Donnelly · Plasma Chemistry and Plasma Processing · 1981 · 310 citations
Natural Sciences, Electrical Engineering, Materials Science +12
Plasma etching of Si and SiO2 in SF6–O2 mixtures
Riccardo d’Agostino, Daniel Flamm · Journal of Applied Physics · 1981 · 272 citations
Natural Sciences, Materials Engineering, Materials Science +16
Complete modal decomposition for optical fibers using CGH-based correlation filters
Thomas Kaiser, Daniel Flamm, Siegmund Schröter et al. · Optics Express · 2009 · 258 citations · Full text
Natural Sciences, Physics, Computational Electromagnetics +15
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