Daniel Flamm

Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas

C. J. Mogab, A. C. Adams, Daniel Flamm · Journal of Applied Physics · 1978 · 561 citations

Engineering, Vacuum Device, Chemistry +17

The reaction of fluorine atoms with silicon

Daniel Flamm, Vincent M. Donnelly, J. A. Mucha · Journal of Applied Physics · 1981 · 330 citations

Engineering, Chemistry, Silicon On Insulator +17

The design of plasma etchants

Daniel Flamm, Vincent M. Donnelly · Plasma Chemistry and Plasma Processing · 1981 · 309 citations

Engineering, Applied Physics, Plasma Physics +4

Plasma etching of Si and SiO2 in SF6–O2 mixtures

Riccardo d’Agostino, Daniel Flamm · Journal of Applied Physics · 1981 · 271 citations

Materials Science, Chemical Engineering, Engineering +11

Complete modal decomposition for optical fibers using CGH-based correlation filters

Thomas Kaiser, Daniel Flamm, Siegmund Schröter et al. · Optics Express · 2009 · 254 citations · Full text

Holography, Engineering, Optical Transmission System +19