Concepedia

Daniel Flamm

DF

76

Publications

6.5K

Citations

43

H-Index

1973

Active since

Affiliations

AT&T (United States)(Current)

Friedrich Schiller University Jena

TRUMPF (Germany)

S&F Systemtechnik (Germany)

Council for Scientific and Industrial Research

Daniel Flamm is an author at AT&T (United States) specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceSurface ScienceOptical PropertiesPhysicsChemistryPhotonicsChemical EngineeringMicroelectronics

Publications per year

1973–2023

76

Publications

76

Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas

C. J. Mogab, A. C. Adams, Daniel Flamm · Journal of Applied Physics · 1978 · 561 citations

Engineering, Vacuum Device, Chemistry +17

The reaction of fluorine atoms with silicon

Daniel Flamm, Vincent M. Donnelly, J. A. Mucha · Journal of Applied Physics · 1981 · 330 citations

Engineering, Chemistry, Silicon On Insulator +17

The design of plasma etchants

Daniel Flamm, Vincent M. Donnelly · Plasma Chemistry and Plasma Processing · 1981 · 309 citations

Engineering, Applied Physics, Plasma Physics +4

Plasma etching of Si and SiO2 in SF6–O2 mixtures

Riccardo d’Agostino, Daniel Flamm · Journal of Applied Physics · 1981 · 271 citations

Materials Science, Chemical Engineering, Engineering +11

Complete modal decomposition for optical fibers using CGH-based correlation filters

Thomas Kaiser, Daniel Flamm, Siegmund Schröter et al. · Optics Express · 2009 · 254 citations · Full text

Holography, Engineering, Optical Transmission System +19

Rows per page

1–5 of 76