A. C. Adams - Concepedia

Author

A. C. Adams

University of California, Santa Barbara

Also Known As

A. C. ADAMS, A. C. Adams, A.C Adams, A.C. Adams, Arnold Adams

Publications

2.7K

Citations

H-Index

Concepts

All Affiliations

University of California, Santa Barbara AT&T (United States)University of New Mexico Sandia National Laboratories Inflammatory Response Research (United States)

About

A. C. Adams is an author at University of California, Santa Barbara specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	24	38	2.2K
2	Applied Physics	22	33	2.1K
3	Natural Sciences	3	3	135
4	Medicine	2	2	33
5	Biochemistry	1	1	26

A. C. Adams

Publications

2.6K

Citations

H-Index

Page 1

	Year	Citations
Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas C. J. Mogab, A. C. Adams, Daniel Flamm Journal of Applied Physics EngineeringVacuum DeviceChemistrySilicon On InsulatorPlasma Processing	1978	561
Spitzer Spectral Observations of the Deep Impact Ejecta C. M. Lisse, J. VanCleve, A. C. Adams, Science PhotometrySpitzer Spectral ObservationsSpitzer Space TelescopeAstrochemistryDeep Impact Encounter	2006	335
Characterization of Plasma‐Deposited Silicon Dioxide A. C. Adams, F. B. Alexander, C. D. Capio, Journal of The Electrochemical Society Materials ScienceThin Film PhysicsNitrous OxideEngineeringPlasma‐deposited Silicon Dioxide	1981	144
The Deposition of Silicon Dioxide Films at Reduced Pressure A. C. Adams, C. D. Capio Journal of The Electrochemical Society Materials ScienceChemical EngineeringEngineeringElectronic MaterialsSurface Science	1979	111
Thermal Nitridation of Silicon in Ammonia Gas: Composition and Oxidation Resistance of the Resulting Films S. P. Murarka, C. C. Chang, A. C. Adams Journal of The Electrochemical Society Materials ScienceMaterials EngineeringChemical EngineeringHigh Temperature MaterialsAmmonia Gas	1979	110
Efficiency of light emission from surface plasmons John Moreland, A. C. Adams, Paul K. Hansma Physical review. B, Condensed matter Materials SciencePhotonicsPlasmonicsVisible LightSurface Plasmons	1982	101
The Chemical Deposition of Boron‐Nitrogen Films A. C. Adams, C. D. Capio Journal of The Electrochemical Society Thin Film PhysicsOptical MaterialsEngineeringOptical AbsorptionStep Coverage	1980	91
Gallium Arsenide Surface Film Evaluation by Ellipsometry Its Effect on Schottky Barriers A. C. Adams, B. R. Pruniaux Journal of The Electrochemical Society Optical MaterialsEngineeringThin Film Process TechnologySurface TechnologyOptical Properties	1973	82
Planarization of Phosphorus‐Doped Silicon Dioxide A. C. Adams, C. D. Capio Journal of The Electrochemical Society Materials ScienceOptical MaterialsEngineeringOptical PropertiesFlowed P‐glass Process	1981	79
Optical properties of low-pressure chemically vapor deposited silicon over the energy range 3.0–6.0 eV B. G. Bagley, D. E. Aspnes, A. C. Adams, Applied Physics Letters Optical MaterialsEngineeringOptoelectronic DevicesOptical CharacterizationSilicon On Insulator	1981	76

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