F. B. Alexander

Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by rf sputtering

P. M. Petroff, T. T. Sheng, A. K. Sinha et al. · Journal of Applied Physics · 1973 · 231 citations

Materials Science, Semiconductors, Material Analysis +14

Characterization of Plasma‐Deposited Silicon Dioxide

A. C. Adams, F. B. Alexander, C. D. Capio et al. · Journal of The Electrochemical Society · 1981 · 144 citations

Materials Science, Thin Film Physics, Nitrous Oxide +12

Tungsten metallization for LSI applications

R. S. Wagner, A. K. Sinha, T. T. Sheng et al. · Journal of Vacuum Science and Technology · 1974 · 74 citations

Engineering, Tungsten Thin Films, Thin Film Process Technology +20

SPONTANEOUS AND STIMULATED INFRA-RED EMISSION FROM INDIUM PHOSPHIDE ARSENIDE DIODES

F. B. Alexander, V. R. Bird, D. R. Carpenter et al. · Applied Physics Letters · 1964 · 47 citations

Semiconductor Technology, V. R. Bird, Electrical Engineering +13

Water splitting TiO2 composite material based on black silicon as an efficient photocatalyst

F. B. Alexander, Meera Almheiri, Pabitra Dahal et al. · Solar Energy Materials and Solar Cells · 2017 · 45 citations

Materials Science, Chemical Engineering, Tio2 Composite Material +11