Herbert H. Sawin

Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher

Arturo A. Ayón, Rebecca A. Braff, C. C. Lin et al. · Journal of The Electrochemical Society · 1999 · 411 citations

Engineering, Materials Engineering, Materials Science +13

The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges

P. J. Hargis, K. E. Greenberg, Paul Miller et al. · Review of Scientific Instruments · 1994 · 332 citations · Full text

Natural Sciences, Electrical Engineering, Microelectronics +14

Charging of pattern features during plasma etching

John Arnold, Herbert H. Sawin · Journal of Applied Physics · 1991 · 292 citations

Natural Sciences, Electrical Engineering, Physics +15

Phenomenological modeling of ion-enhanced surface kinetics in fluorine-based plasma etching

David C. Gray, I. Tepermeister, Herbert H. Sawin · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 255 citations

Natural Sciences, Materials Science, Physics +17

Continuum modeling of radio-frequency glow discharges. I. Theory and results for electropositive and electronegative gases

Εvangelos Gogolides, Herbert H. Sawin · Journal of Applied Physics · 1992 · 220 citations

Natural Sciences, Electrical Engineering, Physics +15