Herbert H. Sawin

Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher

Arturo A. Ayón, Rebecca A. Braff, C. C. Lin et al. · Journal of The Electrochemical Society · 1999 · 408 citations

Electrical Engineering, Anisotropic Profiles, Engineering +13

The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges

P. J. Hargis, K. E. Greenberg, Paul Miller et al. · Review of Scientific Instruments · 1994 · 330 citations · Full text

Electrical Engineering, Plasma Electronics, Engineering +11

Charging of pattern features during plasma etching

John Arnold, Herbert H. Sawin · Journal of Applied Physics · 1991 · 291 citations

Electrical Engineering, Engineering, Microfabrication +12

Phenomenological modeling of ion-enhanced surface kinetics in fluorine-based plasma etching

David C. Gray, I. Tepermeister, Herbert H. Sawin · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 251 citations

Chemical Kinetics, Engineering, Ion-enhanced Surface Kinetics +19

Continuum modeling of radio-frequency glow discharges. I. Theory and results for electropositive and electronegative gases

Εvangelos Gogolides, Herbert H. Sawin · Journal of Applied Physics · 1992 · 216 citations

Electrical Engineering, Electronegative Gases, Engineering +14