Electron Beam Lithography

Electron Beam Lithography is a maskless micro- and nanofabrication lithography technique that patterns resist-coated substrates by scanning a focused beam of electrons to write custom nanoscale features.

4.5K

Publications

188.7K

Citations

15.4K

Authors

1.9K

Institutions

Publications per year

2017–2026

589

Authors

15.4K

  1. HI
    Henry I. Smith

    Massachusetts Institute of Technology, United States

    36 publications · 1.9K citations

    22

    h-index

  2. PD
    Philip D. Rack

    University of Tennessee at Knoxville, United States

    23 publications · 1.2K citations

    20

    h-index

  3. TH
    T. H. P. Chang

    IBM Research - Thomas J. Watson Research Center, United States

    31 publications · 1.6K citations

    20

    h-index

  4. HG
    H. G. Craighead

    Cornell University, United States

    25 publications · 1.3K citations

    20

    h-index

  5. KK
    Karl K. Berggren

    Massachusetts Institute of Technology, United States

    23 publications · 2K citations

    20

    h-index

1–5 of 15.4K

Venues

  1. Applied Physics Letters

    318 publications · 19.1K citations

    76

    h-index

  2. 62

    h-index

  3. Nano Letters

    85 publications · 8.9K citations

    55

    h-index

  4. Nanotechnology

    185 publications · 6.6K citations

    46

    h-index

  5. ACS Nano

    61 publications · 4.3K citations

    39

    h-index

1–5