Forward Scattering Effects
Forward Scattering Effects is a phenomenon in electron beam lithography wherein primary electrons are deflected by small angles due to multiple elastic interactions with atoms in the resist material, resulting in localized broadening of the exposure pattern and limiting the achievable resolution.
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13.5K
Citations
3.8K
Authors
594
Institutions
Publications per year
2017–2026
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Lawrence Berkeley National Laboratory
Berkeley, United States
10 h-index
74 publications
3.4K citations

Centre National de la Recherche Scientifique
Paris, France
10 h-index
163 publications
8.3K citations
University of Arizona
Tucson, United States
6 h-index
32 publications
1.3K citations
University of California, Berkeley
Berkeley, United States
6 h-index
56 publications
2.6K citations
Stanford University
Stanford, United States
6 h-index
19 publications
802 citations
University of Washington
Seattle, United States
5 h-index
17 publications
780 citations

Chinese Academy of Sciences
Beijing, China
5 h-index
47 publications
2.7K citations

Lawrence Livermore National Laboratory
Livermore, United States
5 h-index
24 publications
814 citations
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PRB · 23 publications · 1.2K citations
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PRL · 20 publications · 1.3K citations
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11 publications · 370 citations
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8 publications · 317 citations
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ApJ · 7 publications · 299 citations
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