Forward Scattering Effects

Forward Scattering Effects is a phenomenon in electron beam lithography wherein primary electrons are deflected by small angles due to multiple elastic interactions with atoms in the resist material, resulting in localized broadening of the exposure pattern and limiting the achievable resolution.

278

Publications

13.5K

Citations

3.8K

Authors

594

Institutions

Publications per year

2017–2026

30

Authors

3.8K

  1. AP
    A. P. Kaduwela

    University of California, Davis, United States

    5 publications · 226 citations

    5

    h-index

  2. MV
    M.A. Van Hove

    Lawrence Berkeley National Laboratory, United States

    4 publications · 155 citations

    4

    h-index

  3. TG
    Thomas Greber

    University of Zurich, Switzerland

    3 publications · 176 citations

    3

    h-index

  4. JO
    Jürg Osterwalder

    University of Zurich, Switzerland

    3 publications · 176 citations

    3

    h-index

  5. SY
    S. Y. Tong

    University of Wisconsin–Milwaukee, United States

    3 publications · 337 citations

    3

    h-index

1–5 of 3.8K

Venues

  1. Physical review. B, Condensed matter

    PRB · 23 publications · 1.2K citations

    18

    h-index

  2. Physical Review Letters

    PRL · 20 publications · 1.3K citations

    18

    h-index

  3. 10

    h-index

  4. Applied Optics

    8 publications · 317 citations

    8

    h-index

  5. The Astrophysical Journal

    ApJ · 7 publications · 299 citations

    7

    h-index

1–5