Beam Blanking
Beam Blanking is a beam control technique in electron beam lithography that temporarily deflects the electron beam away from the sample surface to halt exposure, thereby preventing unintended patterning during movement between designated writing locations.
37
Publications
1.1K
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143
Authors
47
Institutions
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2017–2026
7
Parents
37
The story behind the blank spot
Zbigniew Żylicz · American Journal of Hospice and Palliative Medicine® · 1993 · 125 citations
Arts, History, Narratology +2
High-Density Recording Using an Electron Beam Recorder
Yasumitsu Wada, Masahiro Katsumura, Yoshiaki Kojima et al. · Japanese Journal of Applied Physics · 2001 · 57 citations
Masayoshi Esashi, Akira Kojima, Naokatsu Ikegami et al. · Microsystems & Nanoengineering · 2015 · 56 citations · Full text
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Delft University of Technology
Delft, The Netherlands
3 h-index
13 publications
377 citations
IMS Nanofabrication (Austria)
Vienna, Austria
3 h-index
9 publications
150 citations
Simon Fraser University
Burnaby, Canada
1 h-index
2 publications
28 citations

Pennsylvania State University
State College, United States
1 h-index
3 publications
63 citations
Northwestern University
Evanston, United States
1 h-index
1 publications
16 citations
Stanford University
Stanford, United States
1 h-index
4 publications
40 citations

University of Notre Dame
Notre Dame, United States
1 h-index
5 publications
80 citations

Lund University
Lund, Sweden
1 h-index
9 publications
153 citations
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JJAP · 3 publications · 105 citations
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3 publications · 59 citations
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2 publications · 43 citations
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2 publications · 34 citations
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2 publications · 27 citations
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