Beam Blanking

Beam Blanking is a beam control technique in electron beam lithography that temporarily deflects the electron beam away from the sample surface to halt exposure, thereby preventing unintended patterning during movement between designated writing locations.

37

Publications

1.1K

Citations

143

Authors

47

Institutions

Publications per year

2017–2026

7

Authors

143

  1. PK
    P. Kruit

    Delft University of Technology, Netherlands

    3 publications · 84 citations

    3

    h-index

  2. JP
    Jacob P. Hoogenboom

    Delft University of Technology, Netherlands

    3 publications · 84 citations

    3

    h-index

  3. CK
    Christof Klein

    IMS Nanofabrication (Austria), Austria

    2 publications · 28 citations

    2

    h-index

  4. MW
    Mathijs W. H. Garming

    Delft University of Technology, Netherlands

    2 publications · 53 citations

    2

    h-index

  5. IG
    I. Gerward C. Weppelman

    Delft University of Technology, Netherlands

    2 publications · 72 citations

    2

    h-index

1–5 of 143

Venues

  1. Japanese Journal of Applied Physics

    JJAP · 3 publications · 105 citations

    3

    h-index

  2. Review of Scientific Instruments

    3 publications · 59 citations

    3

    h-index

  3. Ultramicroscopy

    2 publications · 43 citations

    2

    h-index

  4. 2

    h-index

  5. 2

    h-index

1–5