Naokatsu Ikegami

Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays

Masayoshi Esashi, Akira Kojima, Naokatsu Ikegami et al. · Microsystems & Nanoengineering · 2015 · 56 citations · Full text

Engineering, Electrical Engineering, Materials Science +16

Characteristics of Very High-Aspect-Ratio Contact Hole Etching

Naokatsu Ikegami, Atsushi Yabata, Takayuki Matsui et al. · Japanese Journal of Applied Physics · 1997 · 51 citations

Engineering, Materials Engineering, Materials Science +17

SiO₂ Etching Employing Inductively Coupled Plasma with Hot Inner Wall

Yasuhiko Chinzei, Takanori Ichiki, Ryo Kurosaki et al. · Japanese Journal of Applied Physics · 1996 · 29 citations

Engineering, Materials Engineering, Materials Science +17

Active-matrix nanocrystalline Si electron emitter array with a function of electronic aberration correction for massively parallel electron beam direct-write lithography: Electron emission and pattern transfer characteristics

Naokatsu Ikegami, Nobuyoshi Koshida, Akira Kojima et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2013 · 27 citations

Engineering, Electrical Engineering, Materials Science +17

Residence time effects on SiO2/Si selective etching employing high density fluorocarbon plasma

Yasuhiko Chinzei, Takanori Ichiki, Naokatsu Ikegami et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 21 citations

Natural Sciences, Materials Engineering, Materials Science +17