Lift-off Patterning

Lift-Off Patterning is a thin-film patterning technique in microfabrication processes wherein a sacrificial resist layer is selectively removed to detach unwanted deposited material from the substrate, thereby delineating patterned features by剥离 (lifting off) the film regions corresponding to the masked areas during resist development.

115

Publications

10.1K

Citations

470

Authors

143

Institutions

Publications per year

2017–2026

13

Authors

470

  1. YM
    Yoshiaki Mokuno

    National Institute of Advanced Industrial Science and Technology, Japan

    4 publications · 285 citations

    4

    h-index

  2. AC
    Akiyoshi Chayahara

    National Institute of Advanced Industrial Science and Technology, Japan

    4 publications · 285 citations

    4

    h-index

  3. HY
    Hideaki Yamada

    National Institute of Advanced Industrial Science and Technology, Japan

    4 publications · 285 citations

    4

    h-index

  4. SC
    Sarawut Cheunkar

    California NanoSystems Institute, United States

    3 publications · 214 citations

    3

    h-index

  5. TM
    Takashi Minemoto

    Ritsumeikan University, Japan

    3 publications · 57 citations

    3

    h-index

1–5 of 470

Venues

  1. Applied Physics Letters

    8 publications · 3.9K citations

    8

    h-index

  2. 8

    h-index

  3. Microelectronic Engineering

    7 publications · 227 citations

    7

    h-index

  4. Journal of Micromechanics and Microengineering

    JMM · 7 publications · 292 citations

    7

    h-index

  5. Nanotechnology

    7 publications · 382 citations

    7

    h-index

1–5