Multilayer Resist Processing is a lithographic technique in electron beam lithography that involves the sequential deposition and selective patterning of multiple resist layers to enable high-aspect-ratio structures, fine feature resolution, and improved pattern transfer fidelity compared to single-layer resist approaches.
43
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2.7K
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181
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52
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2017–2026
1
Parents
Publications
43
Molecular Rulers for Scaling Down Nanostructures
A. Hatzor, Paul S. Weiss · Science · 2001 · 1.7K citations · Full text
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181
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1–5 of 181
Institutions
52
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
3 h-index
11 publications
181 citations
MIT Lincoln Laboratory
Lexington, United States
2 h-index
7 publications
158 citations
Hewlett-Packard (United States)
Palo Alto, United States
2 h-index
8 publications
137 citations
Pennsylvania State University
State College, United States
2 h-index
9 publications
3.7K citations
IMEC
Leuven, Belgium
2 h-index
5 publications
82 citations
IBM (United States)
Armonk, United States
2 h-index
8 publications
96 citations
Bielefeld University
Bielefeld, Germany
1 h-index
7 publications
84 citations
University of Wisconsin–Madison
Madison, United States
1 h-index
6 publications
96 citations
1–8 of 52
Venues
- Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
6 publications · 354 citations
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- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
6 publications · 130 citations
6
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- Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
3 publications · 45 citations
3
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- Microelectronic Engineering
3 publications · 54 citations
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- Journal of The Electrochemical Society
JES · 3 publications · 52 citations
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