Michael M. O'Toole

A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithography

W.G. Oldham, S.N. Nandgaonkar, Andrew R. Neureuther et al. · IEEE Transactions on Electron Devices · 1979 · 216 citations

Engineering, Computer Engineering, Electrical Engineering +15

Spin‐On Glass as an Intermediate Layer in a Tri‐Layer Resist Process

G.W. Ray, Shiesen Peng, Diane Burriesci et al. · Journal of The Electrochemical Society · 1982 · 19 citations

Natural Sciences, Materials Engineering, Materials Science +14

<title>Influence Of Partial Coherence On Projection Printing</title>

Michael M. O'Toole, Andrew R. Neureuther · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1979 · 16 citations

Engineering, Computational Engineering, Additive Manufacturing +14

Linewidth control in projection lithography using a multilayer resist process

Michael M. O'Toole, E.D. Liu, M. S. Chang · IEEE Transactions on Electron Devices · 1981 · 14 citations

Natural Sciences, Electrical Engineering, Microfabrication +13

Characterization of positive resist development

Michael M. O'Toole, William J. Grande · IEEE Electron Device Letters · 1981 · 11 citations

Natural Sciences, Electrical Engineering, Materials Science +12