Andrew R. Neureuther

Author

Also Known As

A Neureuther, A R Neureuther, A R. Neureuther, A. Neureuther, A. R. Neureuther, A.R. Neureuther, Andrew Neureuther, Andrew R. Neureuther, Neureuther, A. R.

381

Publications

3.6K

Citations

H-Index

194

Concepts

All Affiliations

University of California, Berkeley Lawrence Berkeley National Laboratory University of California System

About

Andrew R. Neureuther is an author at University of California, Berkeley specializing in engineering, applied physics, and natural sciences.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	26	71	2.2K
2	Medicine	7	7	185
3	Health Sciences	5	5	154
4	Business	1	1	10
5	Education	1	1	12

Andrew R. Neureuther

Publications

2.7K

Citations

H-Index

Page 1

	Year	Citations
Modeling projection printing of positive photoresists F.H. Dill, Andrew R. Neureuther, Joshua Tuttle, IEEE Transactions on Electron Devices Geometric ModelingProjection Exposure EnvironmentImage Surface ProfilesIllumination ModelingEngineering	1975	232
A general simulator for VLSI lithography and etching processes: Part I&#8212;Application to projection lithography W.G. Oldham, S.N. Nandgaonkar, Andrew R. Neureuther, IEEE Transactions on Electron Devices	1979	214
Self-Organized Silver Nanoparticles for Three-Dimensional Plasmonic Crystals Andrea R. Tao, Daniel P. Ceperley, Prasert Sinsermsuksakul, Nano Letters Materials SciencePlasmonicsEngineeringNano-opticsPhysics	2008	182
A general simulator for VLSI lithography and etching processes: Part II&#8212;Application to deposition and etching W.G. Oldham, Andrew R. Neureuther, Chiakang Sung, IEEE Transactions on Electron Devices	1980	121
Line‐Profile resist development simulation techniques R. Jewett, Paul Isaac Hagouel, Andrew R. Neureuther, Polymer Engineering and Science EngineeringElectron-beam LithographyMicroscopyComputer-aided DesignIntegrated Circuits	1977	111
From poly line to transistor: building BSIM models for non-rectangular transistors Wojtek J. Poppe, Luigi Capodieci, Joanne Wu, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectronic DesignComputer ArchitectureComputer-aided DesignPower Electronics	2006	61
Mask topography effects in projection printing of phase-shifting masks Alfred K. K. Wong, Andrew R. Neureuther IEEE Transactions on Electron Devices Optical MaterialsEngineeringOptic DesignOptical TestingDigital Holography	1994	61
Energy deposition and transfer in electron-beam lithography Bo Wu, Andrew R. Neureuther Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Energy DepositionEngineeringElectron-beam LithographyComputational ChemistryChemistry	2001	60
Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications Alfred K. K. Wong, Andrew R. Neureuther IEEE Transactions on Semiconductor Manufacturing Numerical AnalysisEngineeringElectron-beam LithographyElectromagnetic ScatteringPhotolithographic Applications	1995	57
Development of positive photoresist W.G. Oldham, Andrew R. Neureuther IEEE Transactions on Electron Devices Electrical EngineeringPhotographic StudyEngineeringResistorPhotochemistry	1984	54

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