Paul Isaac Hagouel - Concepedia

Author

Paul Isaac Hagouel

Also Known As

Hagouel, Paul Isaac, Hagouel,P I, P I Hagouel, P. Hagouel, P. I. Hagouel, P.I. Hagouel, Paul Hagouel, Paul Isaac Hagouel, Paul Isaac L. Hagouel

Publications

281

Citations

H-Index

Concepts

All Affiliations

University of California, Berkeley Democritus University of Thrace Hellenic Agency for Local Development and Local Government

About

Paul Isaac Hagouel is an author at University of California, Berkeley specializing in engineering, applied physics, and computer-aided design.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	221
2	Applied Physics	5	5	191
3	Computer Engineering	3	3	66
4	Medicine	1	1	38
5	Natural Sciences	1	1	111

Paul Isaac Hagouel

Publications

231

Citations

H-Index

Page 1

	Year	Citations
Line‐Profile resist development simulation techniques R. Jewett, Paul Isaac Hagouel, Andrew R. Neureuther, Polymer Engineering and Science EngineeringElectron-beam LithographyMicroscopyComputer-aided DesignIntegrated Circuits	1977	111
An efficient photoresist development simulator based on cellular automata with experimental verification Ioannis G. Karafyllidis, Paul Isaac Hagouel, A. Thanailakis, IEEE Transactions on Semiconductor Manufacturing Experimental VerificationEngineeringElectron-beam LithographyMicroscopyPhotobiology	2000	38
Negative resist corner rounding. Envelope volume modeling Paul Isaac Hagouel, Andrew R. Neureuther, Andrew M. Zenk Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Numerical AnalysisEngineeringEnvelope VolumeElectron-beam LithographyMechanical Engineering	1996	19
Quantum computers: Registers, gates and algorithms Paul Isaac Hagouel, Ioannis G. Karafyllidis Quantum CompilersQuantum ScienceEngineeringQuantum ComputingQuantum Gates	2012	18
Developer temperature effect on negative deep ultraviolet resists: Characterization, modeling, and simulation Paul Isaac Hagouel, Ioannis G. Karafyllidis, Andrew R. Neureuther Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographySilicon On InsulatorWafer Scale ProcessingCellular Automata Model	1997	13
Dependence of developed negative resist profiles on exposure energy dose: experiment, modeling, and simulation Paul Isaac Hagouel, Ioannis G. Karafyllidis, Andrew R. Neureuther Microelectronic Engineering Electrical EngineeringEngineeringResistorSpecific ResistanceExposure Energy Dose	1998	12
Simulation of deposition-topography granular distortion for TCAD Ioannis G. Karafyllidis, N. Georgoulas, Paul Isaac Hagouel, Modelling and Simulation in Materials Science and Engineering Granule TemperatureEngineeringMaterial SimulationGranular MediumSimulation	1998	10
X-ray lithographic fabrication of blazed diffraction gratings Paul Isaac Hagouel PhDT	1976	10

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