Statistics
Publications
8
Citations
348
H-Index
8
Active since
2002
O. Joubert is an author at Centre National de la Recherche Scientifique specializing in plasma etching, etching processes, and materials science.
Publications per year
2002–2012
8
8
Etching of porous SiOCH materials in fluorocarbon-based plasmas
N. Possémé, T. Chevolleau, O. Joubert et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 52 citations
Natural Sciences, Materials Engineering, Materials Science +17
Poly-Si/TiN/Mo/HfO2 gate stack etching in high-density plasmas
O. Luere, E. Pargon, L. Vallier et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 27 citations
Natural Sciences, Materials Engineering, Materials Science +17
Design of notched gate processes in high density plasmas
J. Foucher, G. Cunge, Laurent Vallier et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 21 citations
Engineering, Electrical Engineering, Manufacturing Engineering +15
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