S. Banna

Pulsed high-density plasmas for advanced dry etching processes

S. Banna, Ankur Agarwal, Gilles Cunge et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 186 citations · Full text

Engineering, Electrical Engineering, Physics +9

Measurement of bandgap energies in low-k organosilicates

M. T. Nichols, W. Li, D. Pei et al. · Journal of Applied Physics · 2014 · 129 citations

Natural Sciences, Materials Science, Physics +17

Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

S. Banna, Ankur Agarwal, K. Tokashiki et al. · IEEE Transactions on Plasma Science · 2009 · 103 citations

Natural Sciences, Electrical Engineering, Physics +17

Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing

Camille Petit-Étienne, Maxime Darnon, Laurent Vallier et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 74 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Effect of simultaneous source and bias pulsing in inductively coupled plasma etching

Ankur Agarwal, Phillip J. Stout, S. Banna et al. · Journal of Applied Physics · 2009 · 61 citations

Natural Sciences, Materials Engineering, Physics +16