Concepedia

Phillip J. Stout

PJ

Statistics

Publications

10

Citations

245

H-Index

10

Active since

1993

Affiliations

Applied Materials (United States)(Current)

University of Illinois Urbana-Champaign

CFD Research Corporation (United States)

Phillip J. Stout is an author at Applied Materials (United States) specializing in natural sciences, engineering, and plasma etching.

Publications per year

1993–2012

10

Publications

10

Effect of simultaneous source and bias pulsing in inductively coupled plasma etching

Ankur Agarwal, Phillip J. Stout, S. Banna et al. · Journal of Applied Physics · 2009 · 61 citations

Natural Sciences, Materials Engineering, Physics +16

Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry

Phillip J. Stout, Mark J. Kushner · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1993 · 47 citations

Natural Sciences, Materials Engineering, Materials Science +17

Recouping etch rates in pulsed inductively coupled plasmas

Ankur Agarwal, Phillip J. Stout, S. Banna et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 25 citations

Natural Sciences, Electrical Engineering, Physics +17

Modeling surface kinetics and morphology during 3C, 2H, 4H, and 6H–SiC (111) step-flow growth

Phillip J. Stout · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +17

Modeling of high power semiconductor switches operated in the nonlinear mode

Phillip J. Stout, Mark J. Kushner · Journal of Applied Physics · 1996 · 23 citations

Engineering, Electrical Engineering, Materials Science +17

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