Gilles Cunge

Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy

Jean‐Paul Booth, Gilles Cunge, F. Neuilly et al. · Plasma Sources Science and Technology · 1998 · 92 citations

Engineering, Cf Radical, Chemistry +17

Identification of halogen containing radicals in silicon etching plasmas and density measurement by UV broad band absorption spectroscopy

M. Kogelschatz, Gilles Cunge, Nader Sadeghi · Journal of Physics D Applied Physics · 2004 · 48 citations

Analysis of the chemical composition and deposition mechanism of the SiOx–Cly layer on the plasma chamber walls during silicon gate etching

M. Kogelschatz, Gilles Cunge, Nader Sadeghi · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 39 citations · Full text

Chemical Engineering, Ar/cl2 Plasma, Engineering +12

Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe

Maxime Darnon, Gilles Cunge, Nicholas Braithwaite · Plasma Sources Science and Technology · 2014 · 26 citations

Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-<i>block</i>-poly(methylmethacrylate)

Xavier Chevalier, Célia Nicolet, Raluca Tiron et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 26 citations

Engineering, Electron-beam Lithography, Polymer Nanotechnology +25