L. Vallier

Microwave multipolar plasmas excited by distributed electron cyclotron resonance: Concept and performance

M. Pichot, A. Durandet, Jacques Pelletier et al. · Review of Scientific Instruments · 1988 · 131 citations

Engineering, Physics, Applied Plasma Physic +10

Ion flux composition in HBr/Cl2/O2 and HBr/Cl2/O2/CF4 chemistries during silicon etching in industrial high-density plasmas

G. Cunge, R.L. Inglebert, O. Joubert et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 68 citations · Full text

Engineering, Integrated Circuits, Chemistry +18

Etching mechanisms of low-<i>k</i> SiOCH and selectivity to SiCH and SiO2 in fluorocarbon based plasmas

N. Possémé, T. Chevolleau, O. Joubert et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 67 citations

Materials Science, Materials Engineering, Chemical Engineering +14

Electrical properties of Ta2O5 films obtained by plasma enhanced chemical vapor deposition using a TaF5 source

R. A. B. Devine, L. Vallier, Jean‐Luc Autran et al. · Applied Physics Letters · 1996 · 65 citations

Engineering, Reversible Electron Trapping, Thin Film Process Technology +18

X-ray photoelectron spectroscopy investigation of sidewall passivation films formed during gate etch processes

L. Desvoivres, L. Vallier, O. Joubert · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 55 citations

Materials Science, Semiconductors, Electrical Engineering +14