L. Vallier - Concepedia

Author

L. Vallier

Centre National de la Recherche Scientifique

Also Known As

L Vallier, L. Vallier, Laurent Vallier, Vallier, L., Vallier, Laurent, Vallier., L

203

Publications

1.3K

Citations

H-Index

Concepts

All Affiliations

Centre National de la Recherche Scientifique Commissariat à l'Énergie Atomique et aux Énergies Alternatives CEA Grenoble Laboratoire d'Électronique des Technologies de l'Information Laboratoire des Technologies de la Microélectronique

About

L. Vallier is an author at Centre National de la Recherche Scientifique specializing in engineering, applied physics, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	23	34	1.2K
2	Applied Physics	21	31	978
3	Chemical Engineering	8	8	270
4	Chemistry	8	8	313
5	Natural Sciences	3	3	89

L. Vallier

Publications

1.2K

Citations

H-Index

Page 1

	Year	Citations
Microwave multipolar plasmas excited by distributed electron cyclotron resonance: Concept and performance M. Pichot, A. Durandet, Jacques Pelletier, Review of Scientific Instruments EngineeringPhysicsApplied Plasma PhysicMultipolar PlasmasRelativistic Plasma	1988	131
Ion flux composition in HBr/Cl2/O2 and HBr/Cl2/O2/CF4 chemistries during silicon etching in industrial high-density plasmas G. Cunge, R.L. Inglebert, O. Joubert, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringIntegrated CircuitsChemistryPlasma ProcessingAnisotropic Etching	2002	68
Etching mechanisms of low-<i>k</i> SiOCH and selectivity to SiCH and SiO2 in fluorocarbon based plasmas N. Possémé, T. Chevolleau, O. Joubert, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceMaterials EngineeringChemical EngineeringEngineeringPlasma Processing	2003	67
Electrical properties of Ta2O5 films obtained by plasma enhanced chemical vapor deposition using a TaF5 source R. A. B. Devine, L. Vallier, Jean‐Luc Autran, Applied Physics Letters EngineeringReversible Electron TrappingThin Film Process TechnologyChemical DepositionElectrical Properties	1996	65
X-ray photoelectron spectroscopy investigation of sidewall passivation films formed during gate etch processes L. Desvoivres, L. Vallier, O. Joubert Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceSemiconductorsElectrical EngineeringGate Etch ProcessesEngineering	2001	55
Etching of porous SiOCH materials in fluorocarbon-based plasmas N. Possémé, T. Chevolleau, O. Joubert, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceMaterials EngineeringChemical EngineeringDifferent PorosityEngineering	2004	52
Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas X. Detter, R. Palla, I. Thomas-Boutherin, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringSilicon GatesCritical Dimension ControlSilicon On InsulatorPlasma Processing	2003	48
Sub-0.1 μm gate etch processes: Towards some limitations of the plasma technology? L. Desvoivres, L. Vallier, O. Joubert Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringChemical CompositionPlasma PhysicsChemistrySilicon On Insulator	2000	44
Poly-Si∕TiN∕HfO2 gate stack etching in high-density plasmas A. Le Gouil, O. Joubert, G. Cunge, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Gate StackElectrical EngineeringPlasma ElectronicsEngineeringMicrofabrication	2007	44
Polysilicon gate etching in high density plasmas. II. X-ray photoelectron spectroscopy investigation of silicon trenches etched using a chlorine-based chemistry F. H. Bell, O. Joubert, L. Vallier Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyVacuum DeviceSilicon On InsulatorPlasma Processing	1996	42

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