Statistics
Publications
2
Citations
47
H-Index
2
Active since
2011
O. Luere is an author at CEA Grenoble specializing in etching processes, materials science, and silicon materials.
Publications per year
2011–2011
2
2
Poly-Si/TiN/Mo/HfO2 gate stack etching in high-density plasmas
O. Luere, E. Pargon, L. Vallier et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 27 citations
Natural Sciences, Materials Engineering, Materials Science +17
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