Electronics Letters · 2018 · 23 citations · 6 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsField-effect TransistorsHigh-frequency Semiconductor DevicesSemiconductor Device MaterialsWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsBandgap EngineeringCurrent DensityGallium Nitride (Gan) MaterialsMicrowave DevicesMicrowave TransistorsRadio-frequency DevicesWide Bandgap Device Operation In Soft SwitchingWide Bandgap Semiconductor Applications
The first report is presented on the RF operation of AlGaN channel transistor with Al‐composition above 80%. The reported device is a polarisation‐graded field effect transistor (PolFET) featuring an ultra‐wide bandgap (UWBG) AlGaN channel with Al‐composition grading from 65 to 82%. Transistors with a gate length of 0.8 μm were fabricated, with a current density of 265 mA/mm, the highest observed for AlGaN channel transistor with Al‐composition above 80%, and f T / f MAX of 5.4/14.2 GHz. This demonstration of RF operation of polarisation‐graded transistor provides a direction for achieving ultra‐wide bandgap AlGaN based devices for high performance RF and power switching applications.
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