Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography

Electron Resists for Microcircuit and Mask Production

M. Hatzakis · Journal of The Electrochemical Society · 1969 · 195 citations

Engineering, Electrical Engineering, Materials Science +15

Quantum Wire Fabrication by E-Beam Elithography Using High-Resolution and High-Sensitivity E-Beam Resist ZEP-520

Toshio Nishida, Masaya Notomi, R. Iga et al. · Japanese Journal of Applied Physics · 1992 · 119 citations

Engineering, Materials Engineering, Materials Science +17

Optimal temperature for development of poly(methylmethacrylate)

B. Cord, Jodie L. Lutkenhaus, Karl K. Berggren · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 93 citations

Natural Sciences, Materials Engineering, Materials Science +17

Influence of molecular weight of resist polymers on surface roughness and line-edge roughness

Toru Yamaguchi, Kenji Yamazaki, H. Namatsu · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 57 citations

Natural Sciences, Materials Engineering, Materials Science +17

Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modeling

K. Koshelev, Mohammad Mohammad, Taras Fito et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 49 citations

Engineering, Materials Engineering, Materials Science +11