Toru Yamaguchi

Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

Hideo Namatsu, Yasuo Takahashi, Kenji Yamazaki et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 285 citations

Engineering, Electron-beam Lithography, Chemistry +22

Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations

H. Namatsu, Toru Yamaguchi, Masao Nagase et al. · Microelectronic Engineering · 1998 · 156 citations

Engineering, Electronic Materials, Physics +13

Influence of edge roughness in resist patterns on etched patterns

Hideo Namatsu, Masao Nagase, Toru Yamaguchi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 111 citations

Materials Science, Linewidth Fluctuations, Engineering +15

Realization of a high speed biped using modern control theory

Tsutomu Mita, Toru Yamaguchi, Toshio Kashiwase et al. · International Journal of Control · 1984 · 106 citations

Cw-1 Built, Engineering, Motor Control +20

Nanometer-scale linewidth fluctuations caused by polymer aggregates in resist films

Toru Yamaguchi, Hideo Namatsu, Masao Nagase et al. · Applied Physics Letters · 1997 · 105 citations

Engineering, Electron-beam Lithography, Nanostructured Polymer +19