Toru Yamaguchi - Concepedia

Author

Toru Yamaguchi

Also Known As

Kazunori Iwasa, T YAMAGUCHI, T Yamaguchi, T. YAMAGUCHI, T. Yamaguchi, TORU YAMAGUCHI, Takuo Yamaguchi, Toru YAMAGUCHI, Toru Yamaguchi, Yamaguchi, Toru

465

Publications

Citations

H-Index

220

Concepts

All Affiliations

NTT Basic Research Laboratories Tokyo Metropolitan University Fuzzy Systems Institute The University of Tokyo Utsunomiya University

About

Toru Yamaguchi is an author at NTT Basic Research Laboratories specializing in engineering, applied physics, and intelligent systems.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	25	61	2.1K
2	Health Sciences	8	8	205
3	Arts	3	3	47
4	Language Studies	3	3	61
5	Management	1	1	16

Toru Yamaguchi

Publications

2.2K

Citations

H-Index

Page 1

	Year	Citations
Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations Hideo Namatsu, Yasuo Takahashi, Kenji Yamazaki, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyChemistryLinewidth FluctuationBeam Lithography	1998	285
Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations H. Namatsu, Toru Yamaguchi, Masao Nagase, Microelectronic Engineering EngineeringElectronic MaterialsPhysicsNanomaterialsNanotechnology	1998	156
Influence of edge roughness in resist patterns on etched patterns Hideo Namatsu, Masao Nagase, Toru Yamaguchi, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceLinewidth FluctuationsEngineeringSpecific ResistanceFlexible Electronics	1998	111
Realization of a high speed biped using modern control theory Tsutomu Mita, Toru Yamaguchi, Toshio Kashiwase, International Journal of Control Cw-1 BuiltEngineeringMotor ControlLocomotion (Cellular Biology)Advanced Motion Control	1984	106
Nanometer-scale linewidth fluctuations caused by polymer aggregates in resist films Toru Yamaguchi, Hideo Namatsu, Masao Nagase, Applied Physics Letters EngineeringElectron-beam LithographyNanostructured PolymerPolymer NanocompositesLinewidth Fluctuation	1997	105
Fabrication of Si single-electron transistors with precise dimensions by electron-beam nanolithography H. Namatsu, Yoshio Watanabe, Kenji Yamazaki, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Electrical EngineeringEngineeringWire SizeElectron-beam LithographyPrecise Dimensions	2002	64
Fuzzy Associative Memory System Toru Yamaguchi Journal of Japan Society for Fuzzy Theory and Systems Fuzzy LogicFuzzy SystemsEngineeringFuzzy ComputingFuzzy Modeling	1993	59
Influence of molecular weight of resist polymers on surface roughness and line-edge roughness Toru Yamaguchi, Kenji Yamazaki, H. Namatsu Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographySoft MatterResist PolymersResistor	2004	57
Self-organizing control using fuzzy neural networks Toru Yamaguchi, T. Takagi, T. Mita International Journal of Control Artificial IntelligenceFuzzy SystemsMachine LearningNeural Networks (Machine Learning)Fuzzy Neural Networks	1992	51
Line-Edge Roughness: Characterization and Material Origin Toru Yamaguchi, Kenji Yamazaki, Masao Nagase, Japanese Journal of Applied Physics EngineeringElectron-beam LithographyMicroscopyMechanical EngineeringHardness	2003	45

Page 1