Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations

Size dependence of the characteristics of Si single-electron transistors on SIMOX substrates

Yasuo Takahashi, H. Namatsu, K. Kurihara et al. · IEEE Transactions on Electron Devices · 1996 · 195 citations

Engineering, Electrical Engineering, Materials Science +17

Nano edge roughness in polymer resist patterns

Toshiyuki Yoshimura, Hiroshi Shiraishi, Jiro Yamamoto et al. · Applied Physics Letters · 1993 · 89 citations

Engineering, Materials Engineering, Materials Science +12

An Electron Beam Nanolithography System and its Application to Si Nanofabrication

Kenji Kurihara, K. Iwadate, Hideo Namatsu et al. · Japanese Journal of Applied Physics · 1995 · 55 citations

Engineering, Materials Engineering, Materials Science +17

Nano-scale fluctuations in electron beam resist pattern evaluated by atomic force microscopy

Masao Nagase, H. Namatsu, K. Kurihara et al. · Microelectronic Engineering · 1996 · 50 citations

Natural Sciences, Materials Science, Physics +14

10-nm silicon lines fabricated in (110) silicon

H. Namatsu, Masao Nagase, K. Kurihara et al. · Microelectronic Engineering · 1995 · 29 citations

Engineering, Materials Engineering, Materials Science +11