Kenji Kurihara

Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

Hideo Namatsu, Yasuo Takahashi, Kenji Yamazaki et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 285 citations

Engineering, Electron-beam Lithography, Chemistry +22

Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water

Hideo Namatsu, Kenji Kurihara, Masao Nagase et al. · Applied Physics Letters · 1995 · 123 citations

Dimensional Limitations, Engineering, Mechanical Engineering +16

Influence of edge roughness in resist patterns on etched patterns

Hideo Namatsu, Masao Nagase, Toru Yamaguchi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 111 citations

Materials Science, Linewidth Fluctuations, Engineering +15

Nanometer-scale linewidth fluctuations caused by polymer aggregates in resist films

Toru Yamaguchi, Hideo Namatsu, Masao Nagase et al. · Applied Physics Letters · 1997 · 105 citations

Engineering, Electron-beam Lithography, Nanostructured Polymer +19

Multigate single-electron transistors and their application to an exclusive-OR gate

Yasuo Takahashi, Akira Fujiwara, Kenji Yamazaki et al. · Applied Physics Letters · 2000 · 101 citations

Electrical Engineering, Engineering, Nanoelectronics +11