Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modeling

Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Kirill Koshelev, Mohammad Ali Mohammad, Taras Fito, Kenneth L. Westra, Steven K. Dew, Maria Stepanova; Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modeling. J. Vac. Sci. Technol. B 1 November 2011; 29 (6): 06F306. https://doi.org/10.1116/1.3640794 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology B Search Advanced Search |Citation Search